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A new generation of small, cost-effective, CW ultraviolet (UV) lasers allows more applications to move to UV wavelengths for increased power and precision.

The unique absorption properties of 2µm lasers allow them to create small and precise cuts for medical and materials processing applications

雷射擴束鏡對於降低功率密度、最小化遠距離光束直徑以及最小化聚焦雷射光斑尺寸至關重要。

了解最常見的雷射光源、操作模式和增益介質為您的特定應用選擇合適的雷射提供了背景。

超快雷射的短脈衝持續時間使其與光學元件的相互作用不同，從而影響光學元件的雷射損傷閾值。

Understanding the polarization of laser light is critical for many applications, as polarization impacts reflectance, focusing the beam, and other key behaviors.

雷射諧振腔的長度決定了雷射的諧振腔模式，或在腔體內產生駐波的電場分佈。

光透過多種方法被光學介質吸收，包括將電子激發到更高能態以及轉化為熱能

了解最常用的雷射光學材料將有助於輕鬆瀏覽 EO 的多種雷射光學組件選擇。

The industry standard method for quantifying reflectivity does not tell the whole story

計量對於確保光學元件始終滿足其所需的規格至關重要，尤其是在雷射應用中。

Beam Conditioning Optics for UV, IR, and Broadband Lasers

了解確保雷射應用成功必須考慮的關鍵參數。將為這些參數建立通用術語。

了解為什麼玻璃的體雷射誘導損傷閾值 (LIDT) 與帶有塗層（例如 AR 薄膜）的 LIDT 光學元件顯著不同。

測試雷射誘導損傷閾值 (LIDT) 尚未標準化，因此了解光學元件的測試方式對於預測性能至關重要。

了解如何瀏覽用於塑造雷射光束的輻照度輪廓和相位的許多可用選項，以最大限度地提高雷射系統的性能。

雷射誘導損傷閾值 (LIDT) 或雷射損傷閾值 (LDT) 對於選擇或指定雷射光學器件至關重要。在愛特蒙特光學了解更多！

Pulse Compression and Dispersion Compensation for Ultrafast Lasers

高反射率 (HR) 鍍膜應用於光學元件，以最大限度地減少反射雷射和其他光源時的損失。

皮膚護理的未來取決於雷射光學

眼部護理的未來取決於雷射光學。

超快高色散反射鏡對於超快雷射應用中的脈衝壓縮和色散補償、提高系統性能至關重要。

Learn how Highly-Dispersive Mirrors compensate for dispersion and compress pulse duration in ultrafast laser systems, which is critical for maximizing performance.

Laser optics high reflectivity mirrors meet exceptional specifications that Edmund Optics' competitors often fail to meet. Learn more at Edmund Optics.

Mounting flat mirrors by their edges in a kinematic mount imparts stress onto the mirror surface. This results in distortion and reduced quality of the reflected wavefront, which is especially noticeable when using high-quality mirrors. Stemmed mirrors, on the other hand, are mounted from a smaller diameter “stem” protruding from the back of the mirror, resulting in significantly reduced stress on the mirror surface, high stability, and cost reduction and can be used as a replacement for a more expensive and complex kinematic mount and a conventional mirror.

抗反射 (AR) 鍍膜應用於光學元件，以提高吞吐量並減少背反射造成的傷害。

Fluorescence imaging systems are composed of three major components, an illumination source, a photo-activated fluorophore sample, and detector.

Semiconductor supermirrors offer high reflectivity and outperform many IR mirrors on the market. Learn more about these new supermirrors at Edmund Optics.

光學元件中的夾雜物和氣泡造成的不均勻性和散射會導致性能變差，尤其是在雷射光學應用中。