Diameter (mm):

25.40 ±0.25

Surface Flatness (P-V):

λ/10 @ 632.8nm

Single Crystal Silicon

Back Surface:

Commercial Polish

Surface Quality:

10 - 5

Coating Specification:

R_abs >65% @ 13.5nm, 45° (s-pol)

Coating:

Mo/Si Multilayer
Top Layer: Silicon

Coating Type:

Metal/Semiconductor

Angle of Incidence (°):

45

Clear Aperture (%):

90

Design Wavelength DWL (nm):

13.5

Edges:

Fine Ground

Parallelism (arcmin):

3

Surface Roughness (Å):

<5 RMS

Thickness (mm):

6.35 ±0.508

Thickness Tolerance (mm):

0.508

Type:

Flat Mirror

Wavelength Range (nm):

12.92 - 13.90

Full Width-Half Max FWHM (nm):

0.98

Center Energy (eV):

92

Reflection at DWL (%):

>65

13.5nm, 25.4mm Dia, 45° AOI, EUV Flat Mirror