- Small, <1cm³, Form Factor
- Greater than 70% Minimum Transmission and >30dB Minimum Isolation
- Input Apertures as Low as 1.60mm
- Ideal for High-Power and Ultrashort Pulse Systems
- Fixed Magnifications Available from 1.5X to 8X
- Designed for Diffraction Limited Performance
- Ideal for High-Power and Ultrashort Pulse Systems
- Continuous Magnifications Ranges from 1X to 10X
- Designed for Diffraction Limited Performance
- High Reflectivity at 1030nm and High Transmission at 940nm
- Low Group Delay Dispersion (GDD) <±100fs2
- Dichroic Mirror Ideal for Ytterbium (Yb) Lasers
- 在入射角(AOI)為 45° 時保持入射圓偏振光的偏振態
- 反射率在 532 或 1064下高達 99.9%、在 650nm 時為 80% 以便對準
- 提供直徑為 12.7mm、25.4mm 和 50.8mm選項
- 在設計波長範圍內 GDD 低至±20fs2
- 反射率大於 99.9%
- 適用於Ti:sapphire and Yb:doped超快雷射
- 1310nm 波段反射率 >99.8%
- 1295 - 1325nm 波長範圍內平均反射率可達99.5%
- 高雷射損傷閾值
- 多種波長雷射光反射鏡可選
- 920nm 波段有>99.8%的絕對反射率
- 905 - 935nm 波段有99.5%的平均反射率
- 高雷射損傷閾值
- 多種波長雷射光反射鏡可選
- 設計波段反射率>99.5%
- 低熱膨脹係數
- 532/1064nmh 或 635/670/1064nm 波段可選
- >99.5% Reflectivity at 755nm and >90% Reflectivity at 625 – 650nm
- 10-5 Surface Quality and λ/10 Surface Flatness
- Ideal for use in Dermatological Applications
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