- 領先業界的 19 至 31mm 工作距離
- 由愛特蒙特光學設計及製造,適用於聚焦或成像應用
- 主動對準以實現最佳效能
- 190nm 至 11μm 的超寬光譜帶,無色像差
- 亦提供 高效能reflx™物鏡
- 繞射極限效能:λ/14 RMS 穿透波前
- 採用錐形設計,在入射角為45°時可取得更大的間隙
- 採用曲線型十字軸支架,以降低繞射影響
- 亦提供 reflx™反射物镜 物鏡
Laser Microscopy is used to image samples through the use of focused laser beams. In general Laser Microscopy applications, a sample is scanned by a focused laser beam and the intensity of the reflected beam is converted to a digital image. Confocal microscopy, also known as confocal laser scanning microscopy, offers various advantages over traditional wide-field microscopy, such as enhanced resolution, targeted imaging location, and higher image depth. Common laser microscopy techniques include super-resolution microscopy, fluorescence microscopy, and two- or multi-photon microscopy.
Edmund Optics offers a range of Laser Microscopy objectives in finite and infinite conjugate styles for use with common laser wavelengths, such as those of popular laser diodes or Nd:YAG harmonics. Our TECHSPEC® ReflX™ Objectives are reflective microscope objectives that can efficiently focus laser light without introducing any chromatic aberration. These objectives feature a rugged design to withstand exposure to moderate heat or abrasion and are ideal in applications that range from FTIR spectroscopy to semiconductor inspection. TECHSPEC® High Performance ReflX™ Objectives are also available, providing better peak-to-valley transmitted wavefront and a design that allows for angles of incidence up to 45°. Mitutoyo Objectives, with excellent performance at Nd:YAG harmonics, are ideal for integration into semiconductor inspection or laser cutting applications.
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